Објављен
ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.
ПОВУЧЕН
ISO 14237:2000
ОБЈАВЉЕН
ISO 14237:2010
90.93
Одлука о потврђивању стандарда
5. 10. 2021.