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ISO 14237:2010

Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
9. 7. 2010.

Опште информације

90.93     5. 10. 2021.

ISO

ISO/TC 201/SC 6

Međunarodni standard

71.040.40  

engleski   francuski  

Kupovina

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Apstrakt

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.

Životni ciklus

PRETHODNO

POVUČEN
ISO 14237:2000

TRENUTNO

OBJAVLJEN
ISO 14237:2010
90.93 Odluka o potvrđivanju standarda
5. 10. 2021.