Објављен
This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.
ОБЈАВЉЕН
ISO 22278:2020
90.60
Завршетак поступка преиспитивања стандарда
3. 12. 2025.