This document specifies the requirements and guidelines for applying atomic layer deposition (ALD) coatings of alumina on solar cells. It covers the entire ALD coating process, including substrate preparation, precursor selection, deposition parameters, film characterization, and quality control. It applies to manufacturers, researchers, and regulatory bodies involved in the development and production of silicon solar cells with ALD alumina coatings. It ensures consistent and high-quality deposition, improving the performance and stability of silicon solar cells.
PROJECT
ISO/DIS 25141
40.20
DIS ballot initiated: 12 weeks
Oct 26, 2026
To view the full content, you need to register or to log in to your account by clicking on the "Log in" button