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SRPS EN 62047-26:2016

Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures

Jul 28, 2016

General information

90.93     Dec 15, 2025

90.00    Dec 15, 2030

ISS

N022

European Norm

31.080.99  

English  

sednica 2016-05-27

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Scope

IEC 62047-26:2016 specifies descriptions of trench structure and needle structure in a micrometer scale. In addition, it provides examples of measurement for the geometry of both structures. For trench structures, this standard applies to structures with a depth of 1 µm to 100 µm; walls and trenches with respective widths of 5 µm to 150 µm; and aspect ratio of 0,006 7 to 20. For needle structures, the standard applies to structures with three or four faces with a height, horizontal width and vertical width of 2 µm or larger, and with dimensions that fit inside a cube with sides of 100 µm.
This standard is applicable to the structural design of MEMS and geometrical evaluation after MEMS processes.

Life cycle

NOW

PUBLISHED
SRPS EN 62047-26:2016
90.93 Standard confirmed
Dec 15, 2025

Related project

Adopted from EN 62047-26:2016