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ISO/FDIS 19383

Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors

General information

50.00     Dec 3, 2025

ISO

ISO/TC 107

International Standard

25.220.01  

Scope

This document describes the chemical characteristics and related process specifications of the atomic layer deposition precursors, including assay content, metal purity, and anion content specification.

Life cycle

NOW

PROJECT
ISO/FDIS 19383
50.00 Final text received or FDIS registered for formal approval
Dec 3, 2025