10.99 Oct 20, 2026
ISO
ISO/TC 206
International Standard
This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.
PUBLISHED
ISO 22278:2020
PROJECT
ISO/AWI 22278
10.99
New project approved
Oct 20, 2026