10.99 20. 10. 2026.
ISO
ISO/TC 206
Međunarodni standard
This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.
OBJAVLJEN
ISO 22278:2020
PROJEKAT
ISO/AWI 22278
10.99
Novi projekat se prihvata
20. 10. 2026.