naSRPS EN IEC 63567-3:2026
Semiconductor devices - Performance evaluation of semiconductor processing components and inspection equipment - Part 3: Nano-scale wafer surface inspection method using UV light
General information
40.20
Sep 11, 2026
40.60
Nov 13, 2026
ISS
N022
European Norm
31.080.99
English
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Life cycle
NOW
PROJECT
naSRPS EN IEC 63567-3:2026
40.20
DIS ballot initiated: 12 weeks
Sep 11, 2026
Related project
Adopted from
prEN IEC 63567-3:2026
IDENTICAL
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