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IEC 63567-1 ED1

Semiconductor devices - Performance evaluation of semiconductor processing components and inspection equipment - Part 1: Transmittance evaluation method of EUV pellicle

General information

50.20     Sep 25, 2026

PRVD    Nov 6, 2026

IEC

TC 47

International Standard

31.080.99  

Scope

IEC 63567-1 ED1 proposes a method of measuring the transmittance of extreme ultraviolet (EUV) pellicle used for extreme ultraviolet lithography (EUVL) and provides guidelines on the conditions of the transmittance measurement instrument using EUV with a short wavelength and methods for calculating EUV transmittance.
The scope of this document applies to all types of membranes attached to the front side of a reflective mask (or reflective reticle) used in EUVL to physically protect the reflective mask from contaminant particles generated inside the chamber during EUV exposure.

Life cycle

NOW

PROJECT
IEC 63567-1 ED1
50.20 Proof sent to secretariat or FDIS ballot initiated: 8 weeks
Sep 25, 2026

National adoptions

dnaSRPS EN IEC 63567-1:2026  
ISS

Semiconductor devices - Performance evaluation of semiconductor processing components and inspection equipment - Part 1: Transmittance evaluation method of EUV pellicle

50.20   Proof sent to secretariat or FDIS ballot initiated: 8 weeks

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