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dnaSRPS EN IEC 63567-1:2026

Semiconductor devices - Performance evaluation of semiconductor processing components and inspection equipment - Part 1: Transmittance evaluation method of EUV pellicle

General information

50.20     Sep 25, 2026

50.60    Nov 6, 2026

ISS

N022

European Norm

31.080.99  

English  

Scope

IEC 63567-1 ED1 proposes a method of measuring the transmittance of extreme ultraviolet (EUV) pellicle used for extreme ultraviolet lithography (EUVL) and provides guidelines on the conditions of the transmittance measurement instrument using EUV with a short wavelength and methods for calculating EUV transmittance.
The scope of this document applies to all types of membranes attached to the front side of a reflective mask (or reflective reticle) used in EUVL to physically protect the reflective mask from contaminant particles generated inside the chamber during EUV exposure.

Life cycle

NOW

PROJECT
dnaSRPS EN IEC 63567-1:2026
50.20 Proof sent to secretariat or FDIS ballot initiated: 8 weeks
Sep 25, 2026

Related project

Adopted from FprEN IEC 63567-1:2026 IDENTICAL

Adopted from IEC 63567-1 ED1 IDENTICAL

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