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Glavni meni

ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
18. 6. 2019.

Опште информације

90.93     4. 10. 2024.

ISO

ISO/TC 206

Međunarodni standard

81.060.30  

engleski  

Kupovina

Objavljen

Jezik na kome želite da primite dokument.

Apstrakt

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

Životni ciklus

TRENUTNO

OBJAVLJEN
ISO 21859:2019
90.93 Odluka o potvrđivanju standarda
4. 10. 2024.