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ISO 14606:2015

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
1. 12. 2015.
95.99   Povučen   21. 11. 2022.

Опште информације

95.99     21. 11. 2022.

ISO

ISO/TC 201/SC 4

Međunarodni standard

71.040.40  

engleski  

Kupovina

Povučen

Jezik na kome želite da primite dokument.

Apstrakt

ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.

Životni ciklus

PRETHODNO

POVUČEN
ISO 14606:2000

TRENUTNO

POVUČEN
ISO 14606:2015
95.99 Povučen
21. 11. 2022.

REVIDIRAN OD

OBJAVLJEN
ISO 14606:2022